OverviewComponentsVs monocrystalline siliconDeposition methodsUpgraded metallurgical-grade siliconPotential applicationsNovel ideasManufacturers
At the component level, polysilicon has long been used as the conducting gate material in MOSFET and CMOS processing technologies. For these technologies, it is deposited using low-pressure chemical-vapour deposition (LPCVD) reactors at high temperatures and is usually heavily doped n-type or p-type. More recently, intrinsic and doped polysilicon is being used in large-area electronics a
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